This study presents the development of a high-power LC circuit for generating arc plasma in a vacuum, utilizing argon as the working gas. Arc plasma is generated by applying 900 W of high power to two pin plate electrodes, resulting in powerful electric fields that excite and ionize argon particles. The system's I-V characteristics were investigated. Optical emission spectroscopy is a technique for diagnosing plasma formation that calculates electron temperature and density for various powers at varying pressures. This design allowed for a high deposition rate within an exceptionally short time, up to 25 s. Thin films of 229, 346, 468, and 592 nm thicknesses are deposited on glass at 100, 300, 600, and 900 W deposition powers. This design's key characteristic is used in the production of electrodes that are deposited on the glass. The electrical resistivity of films has been studied as a function of film thickness. The 4-point probe technique was used to assess those parameters. For the ranges investigated, the film's resistivity decreases linearly with its thickness.
